Tam sim no, kev lag luam EUV lithography siv lub laser plasma-type-extreme ultraviolet (LPP-EUV) lub teeb qhov system, uas yog tsim los ntawm lub laser tsav, lub hom phiaj droplet, thiab daim iav collector. Tom qab ob lub foob pob tawg ntawm lub hom phiaj los ntawm lub tshuab tsav laser, lub tin yuav ua tiav ionized thiab tsim kom muaj zog EUV hluav taws xob, uas yuav raug cuam tshuam thiab tsom mus rau qhov chaw focal point (IF point) los ntawm daim iav sau thiab ces nkag mus rau hauv. kev xa mus tom ntej ntawm txoj kev teeb.
Cov txheej txheem ntawm excitation thiab tsom ntawm EUV feem ntau nrog rau tiam thiab convergence ntawm lwm bands ntawm lub teeb (Tawm-ntawm-band, OoB). Qee lub teeb no tuaj yeem raug tshem tawm siv tom qab hydrogen lossis tsis hnov tsw rau photoresist, yog li lawv qhov cuam tshuam tsawg heev. Txawm li cas los xij, muaj lwm cov teeb pom kev zoo uas tuaj yeem ua rau muaj kev puas tsuaj loj rau tag nrho cov lithography thiab cuam tshuam rau qhov kev ua tau zoo kawg nkaus, xws li sib sib zog nqus ultraviolet (DUV) thiab infrared (IR) lub teeb hauv qab 300 nm. Cov qub tshwm sim los ntawm laser bombardment ntawm lub hom phiaj tin, uas ua rau kom txo tau qhov sib piv ntawm lithographic qauv vim hais tias lub photoresist yog heev rhiab heev rau lub teeb ntawm no band; thaum kawg tshwm sim los ntawm kev tsav tsheb laser, nws lub zog siab yuav ua rau cov cua kub sib txawv ntawm cov khoom siv kho qhov muag, qhov ncauj qhov ntswg, thiab wafers, uas txo qhov precision ntawm cov qauv thiab ua rau cov khoom siv kho qhov muag puas. Tsis tas li ntawd, qhov kev xav ntawm qhov sau daim iav saum npoo ntawm qhov qub yog yuav luag zoo ib yam li ntawm EUV, thaum lub reflectivity ntawm lub tom kawg yog ze rau 100%, raws li qhia hauv daim duab 1. Siv IR ua piv txwv, raws li lub teeb tsav tsheb. qhov chaw laser fais fab xav tau rau 20 kW, tom qab sau daim iav rov qab thiab sib sau ua ke, nws lub zog kom ncav cuag IF point yog tseem ze li ntawm 10%, uas yog, txog 2 kW; Txawm li cas los xij, txhawm rau ua kom IR ntawm tag nrho cov kab ke yuav luag tsis muaj txiaj ntsig, nws yog ib qho tsim nyog los txo lub zog ntawm IF point ntawm tsawg kawg yog 1%, uas yog, tsuas yog 20 W hauv qab no. Nrog rau qhov kev thov siab, nws yog ib qho tsim nyog los lim tawm OoB hluav taws xob, uas yuav ua rau kev ua haujlwm ntawm lub teeb pom kev zoo heev yog tias nws tsis tau lim tawm kom nws yuav cuam tshuam los ntawm cov iav tsom iav thiab nkag mus rau txoj kev teeb tom ntej.
Fig. 1 Muab xam qhov cuam tshuam ntawm qhov sib txawv wavelength bands ntawm lub teeb los ntawm 50- txheej molybdenum / silicon multilayer nrog lub sij hawm ntawm 6.9 nm thiab molybdenum / silicon piv ntawm 0.4 nyob rau saum npoo ntawm daim iav collector .
Lim qauv hauv EUV lithography teeb qhov system
Pab neeg ntawm Nan Lin thiab Yuxin Leng los ntawm Lub Xeev Tseem Ceeb Laboratory ntawm Intense Field Laser Physics, Shanghai Institute of Optical Machinery, Suav Academy ntawm Kev Tshawb Fawb (SIOM), tau txheeb xyuas cov thev naus laus zis tseem ceeb, cov teeb meem tseem ceeb thiab cov qauv yav tom ntej ntawm EUVL lim tshuab nrog. hwm rau qhov tawm-ntawm-band wavelengths hauv EUV lithography teeb qhov chaw.
Cov txiaj ntsig tau luam tawm nyob rau hauv tsab xov xwm ntawm High Power Laser Science thiab Engineering 2023, No. 5 (Nan Lin, Yunyi Chen, Xin Wei, Wenhe Yang, Yuxin Leng. Spectral purity systems thov rau laser-produced plasma ultraviolet lithography qhov chaw: a tshuaj xyuas[J]. High Power Laser Science thiab Engineering, 2023, 11(5): 05000e64).
Hauv EUVL lub teeb pom kev zoo, cov plasma-tsim DUV thiab IR los ntawm lub teeb tsav tsheb feem ntau muaj kev cuam tshuam loj rau kev ua haujlwm lithography thiab lub neej ntawm qhov kho qhov muag, thiab molybdenum / silicon multilayer zaj duab xis qauv ntawm qhov chaw Cov iav tsom iav muaj qhov cuam tshuam siab rau lawv, yog li EUVL lub teeb pom kev lim dej feem ntau yog tsim rau lawv. DUV tsis tshua muaj zog siv zog, kev siv ntawm transmissive los yog reflective ywj siab zaj duab xis qauv yuav ua tau zoo filtering nyhuv, tab sis vim tsis tshua muaj neeg kho tshuab lub zog ntawm cov zaj duab xis qauv yog ib qho yooj yim ua rau cov zaj duab xis rupture thiab lwm yam teeb meem, cov kev pab cuam lub neej yog luv dua. Hauv qhov sib piv, IR nrog lub zog siab tsis tuaj yeem lim tau yooj yim los ntawm kev siv cov ntxaij lim dej nyias nyias. Hloov chaw, cov txheej txheem ntau txheej grating yuav tsum tau ua tiav thiab coated ntawm cov khoom siv iav substrate (pom hauv daim duab 2), txhawm rau lim IR ntawm cov wavelengths tshwj xeeb los ntawm kev sib txawv thiab khaws EUV hluav taws xob ntau li ntau tau (pom hauv daim duab 3. ). Txoj kev no tso siab heev rau kev tsim, kev ua thiab kev ntsuas ntawm cov qauv grating, tshwj xeeb tshaj yog nyob rau hauv kev tswj ntawm grating nto roughness thiab uniformity ntawm multilayer zaj duab xis, nrog rau cov kev cuam tshuam ntawm qhov siab-raws li qhov tsis zoo ntawm cov qauv grating. nyob rau hauv lub reflectivity, uas peb yuav tsum tau ntsuas rau tsuas yog ob peb nanometers los yog txawm sub-nanometers. Nyob rau hauv cov nqe lus ntawm tag nrho cov EUVL lub teeb qhov system, cov khoom lim txiav txim siab tias qhov kawg lim dej yog qhov nyuaj rau muaj nyob rau hauv ib qho qauv, uas yuav tsum tau xav txog ob qho tib si cov qauv nyias nyias nyias thiab cov qauv tsim ntawm daim iav. , txhawm rau kom paub txog qhov cuam tshuam ntawm lithographic kev ua tau zoo ntawm OoB rau kev pom tag nrho, thiaj li ua kom lub siab dawb huv ntawm EUV lub teeb ci.
Fig. 2 Schematic daim duab ntawm cov qauv grating ua rau hauv daim iav collector.
Daim duab 3 Schematic daim duab ntawm lub hauv paus ntsiab lus ntawm IR filtering los ntawm built-in grating qauv ntawm sau daim iav.
Tsab ntawv xov xwm sau txog cov ntsiab lus tseem ceeb ntawm EUVL lub teeb pom kev lim dej, tshuaj xyuas cov thev naus laus zis tseem ceeb ntawm kev lim OoB hluav taws xob, thiab sib tham txog cov teeb meem tseem ceeb thiab kev txhim kho yav tom ntej hauv lub teeb pom kev siv. cov qauv, thiab thiaj li yuav tau txais ib tug high-purity EUV lub teeb qhov chaw, nws yog tsim nyog los txhim kho kev tsim ntawm filtering system, advanced manufacturing txheej txheem, thiab cov kev ntsuas siab heev. Txhawm rau kom tau txais lub siab purity EUV lub teeb ci, nws yog qhov tseem ceeb los txhim kho kev tsim cov lim dej, txheej txheem tsim khoom, thiab ntsuas txoj kev.
